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CHTM

Start the process to access our cleanroom facilities.

Latest from UNM NanoFab

Announcement Sept 2025 • NanoFab

Fully automated 50 kV electron beam lithography with sub-20 nm overlay and high-throughput exposures is online and ready for users.

Announcement Sept 2025 • NanoFab

Integrated SEM analytics with professional-grade EBL (1.6 nm min beam size) enables write-and-verify workflows without sample transfer.

Event TBA • NanoFab

Hands-on alignment & process tips. Details coming soon.

Training Fridays • 9:00–10:15

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Our latest publication explores cutting-edge semiconductor fabrication techniques that improve efficiency and reduce waste.

A new study from our facility outlines improved safety protocols that have been adopted across multiple research labs.