
Fully automated 50 kV electron beam lithography with sub-20 nm overlay and high-throughput exposures is online and ready for users.
Start the process to gain access to UNM NanoFab cleanroom facilities, training resources, and fabrication equipment.

Fully automated 50 kV electron beam lithography with sub-20 nm overlay and high-throughput exposures is online and ready for users.
Integrated SEM analytics with professional-grade EBL (1.6 nm min beam size) enables write-and-verify workflows without sample transfer.
Hands-on alignment & process tips. Details coming soon.
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Our latest publication explores cutting-edge semiconductor fabrication techniques that improve efficiency and reduce waste.
A new study from our facility outlines improved safety protocols that have been adopted across multiple research labs.