A Cleanroom is a space/laboratory. It is a controlled environment that filters pollutants like dust, airborne microbes, aerosol particles to provide the cleanest particle free area as possible1. These spaces are used for production of products like Electronic Devices, Pharmaceuticals and medical equipment 1. Along with particle count we also monitor temperature, airflow and humidity. Cleanrooms are classified depending on the number of particles in the air per cubic meter UNM NanoFab is a Class 1000 (Bay 1,2,3) and Class 100 (Bay 4).
If you wish to be trained on cleanroom equipment, please contact: Maya Narayanan Kutty.
| Day | Hours |
|---|---|
| Monday | 9:00 AM – 6:00 PM |
| Tuesday | 9:00 AM – 6:00 PM |
| Wednesday | 9:00 AM – 6:00 PM |
| Thursday | 9:00 AM – 6:00 PM |
| Friday | 9:00 AM – 6:00 PM |
| Weekends & Holidays | By approval only |
Tool ID | Tool Manufacturer / Name | Comments |
|---|---|---|
| AB01 | Local Mfg N/A Acid Bench | |
| AB02 | Local Mfg N/A Acid Bench | |
| ALPS01 | Tencor Alpha Step 500 | |
| BB01 | Local Mfg N/A Base Bench | |
| BB02 | Various N/A Gold Electroplating | |
| BB03 | Local Mfg N/A Developer Bench | |
| CVD01 | SAMCO PD-10 PECVD | TIP |
| ELP01 | Gaertner L125B Ellipsometer | |
| EVAP01 | Airco Temescal N/A Metal I Evaporator | TIP |
| EVAP02 | Telemark N/A Metal II Evaporator | TIP |
| EVAP03 | CHA Mark 40 Dielectric Evaporator | TIP |
| EVAP04 | Sharon Vacuum N/A Thernal Evaporator | TIP |
| FRN01 | Lindberg S5357-BDS Silicon Oxidation Furnace | TIP |
| FRN02 | Lindberg S5359-BDS Silicon Diffusion Furnace | TIP |
| FRN05 | Expert Semiconductor Expertech III-V Steam Oxidation Furnace | |
| HTP01 | Dataplate 720 Series Hot Plate | |
| HTP02 | Dataplate 720 Series Hot Plate | |
| HTP03 | Dataplate 720 Series Hot Plate | |
| HTP04 | Dataplate 720 Series Hot Plate | |
| LAM01 | LAM Planar Etcher #01 | |
| LAM02 | LAM Planar Etcher #02 | |
| MA01 | Karl Suss MJ83 Mask Aligner | |
| MA03 | Karl Suss MJ83 Mask Aligner | |
| MA04 | Karl Suss MJ83 Mask Aligner | |
| MIC01 | Leitz Ergolutz Microscope | |
| MIC03 | Nikon UM-2 Microscope | |
| OVN01 | Blue M OV-8A Oven | |
| OVN02 | Blue M OV-8A Oven | |
| OVN03 | Blue M OV-472A-3 Oven | |
| OVN04 | Blue M OV-472A-4 Oven | |
| PE01 | PlasmaTherm/Unaxis ICP | TIP |
| PE02 | Technics PEII-A Planar Etcher | |
| PE04 | Plasmaline Asher Planar Etcher | |
| PE05 | Plasma Technology Plasmaline | TIP |
| RTA01 | Modular Process RTA | |
| RTA02 | Process Products 1150 RTA | |
| SB01 | Solvent Bench | |
| SB02 | Solvent Bench | |
| SB03 | Solvent Bench | |
| SPIN01 | Headway Research Spinner | |
| SPIN02 | Headway Research Spinner | |
| STPR01 | Stepper |
Manuf. | Photoresist | Tone | Exposure Wavelengths (in nm) | Reference | Aspect Ratio / Resolution | Primary Uses / Applications | SDS |
|---|---|---|---|---|---|---|---|
| AZ | 5206-E | Positive | 1.0 - 2.0μm | i-,h-line | High resolution | ||
| AZ | 5214-E | Positive | 1.0-2.0μm | i-,h-line | High resolution | ||
| AZ | 5214-EIR | Negative | 1.0-2.0μm | i-,h-line | High resolution | ||
| AZ | nLOF 2020 | Negative | 1.5-4.5μm | i-line | Lift off | ||
| AZ | nLOF 2035 | Negative | 3.0-6.0μm | i-line | Lift off | ||
| AZ | P4210 | Positive | 1.6-2.4μm | h,g-line | 2 to 1 | ||
| AZ | P4330-RS | Positive | 2.5-3.8μm | h,g-line | 2 to 1 | ||
| AZ | P4620 | Positive | 4.7-7.1μm | h,g-line | 2 to 1 | ||
| DOW | SPR 220-3.0 | Positive | 2.0-4.5μm | i-line, broadband | General Purpose | ||
| DOW | SPR 510A | Positive | .75-1.15μm | i-line | |||
| DOW | Ultra-I 123-0.8 | Positive | .09-.5μm | i-line | General Purpose |
